Other articles related with "interface traps":
57305 Wen-Hao Zhang(张文浩), Ma-Guang Zhu(朱马光), Kang-Hua Yu(余康华), Cheng-Zhan Li(李诚瞻),Jun Wang(王俊), Li Xiang(向立), and Yu-Wei Wang(王雨薇)
  Impact of low-dose radiation on nitrided lateral 4H-SiC MOSFETs and the related mechanisms
    Chin. Phys. B   2023 Vol.32 (5): 57305-057305 [Abstract] (173) [HTML 1 KB] [PDF 917 KB] (195)
77303 Peng Liu(刘鹏), Ji-Long Hao(郝继龙), Sheng-Kai Wang(王盛凯), Nan-Nan You(尤楠楠), Qin-Yu Hu(胡钦宇), Qian Zhang(张倩), Yun Bai(白云), and Xin-Yu Liu(刘新宇)
  Impact of O2 post oxidation annealing on the reliability of SiC/SiO2 MOS capacitors
    Chin. Phys. B   2021 Vol.30 (7): 77303-077303 [Abstract] (478) [HTML 1 KB] [PDF 652 KB] (102)
107302 Si-Qi Jing(荆思淇), Xiao-Hua Ma(马晓华), Jie-Jie Zhu(祝杰杰)†, Xin-Chuang Zhang(张新创), Si-Yu Liu(刘思雨), Qing Zhu(朱青), and Yue Hao(郝跃)
  Interface and border trapping effects in normally-off Al2O3/AlGaN/GaN MOS-HEMTs with different post-etch surface treatments
    Chin. Phys. B   2020 Vol.29 (10): 107302- [Abstract] (591) [HTML 1 KB] [PDF 1123 KB] (78)
97301 Ji-Long Hao(郝继龙), Yun Bai(白云), Xin-Yu Liu(刘新宇), Cheng-Zhan Li(李诚瞻), Yi-Dan Tang(汤益丹), Hong Chen(陈宏), Xiao-Li Tian(田晓丽), Jiang Lu(陆江), Sheng-Kai Wang(王盛凯)
  Improved electrical properties of NO-nitrided SiC/SiO2 interface after electron irradiation
    Chin. Phys. B   2020 Vol.29 (9): 97301-097301 [Abstract] (566) [HTML 0 KB] [PDF 547 KB] (58)
37301 Xin-Yu Liu(刘新宇), Ji-Long Hao(郝继龙), Nan-Nan You(尤楠楠), Yun Bai(白云), Yi-Dan Tang(汤益丹), Cheng-Yue Yang(杨成樾), Sheng-Kai Wang(王盛凯)
  High-mobility SiC MOSFET with low density of interface traps using high pressure microwave plasma oxidation
    Chin. Phys. B   2020 Vol.29 (3): 37301-037301 [Abstract] (770) [HTML 1 KB] [PDF 1104 KB] (247)
67304 Si-Qin-Gao-Wa Bao(包斯琴高娃), Xiao-Hua Ma(马晓华), Wei-Wei Chen(陈伟伟), Ling Yang(杨凌), Bin Hou(侯斌), Qing Zhu(朱青), Jie-Jie Zhu(祝杰杰), Yue Hao(郝跃)
  Method of evaluating interface traps in Al2O3/AlGaN/GaN high electron mobility transistors
    Chin. Phys. B   2019 Vol.28 (6): 67304-067304 [Abstract] (841) [HTML 1 KB] [PDF 591 KB] (197)
37104 Wenbo Li(李文波), Ling Li(李玲), Fangfang Wang(王方方), Liu Zheng(郑柳), Jinghua Xia(夏经华), Fuwen Qin(秦福文), Xiaolin Wang(王晓琳), Yongping Li(李永平), Rui Liu(刘瑞), Dejun Wang(王德君), Yan Pan(潘艳), Fei Yang(杨霏)
  Passivation effects of phosphorus on 4H-SiC (0001) Si dangling bonds: A first-principles study
    Chin. Phys. B   2017 Vol.26 (3): 37104-037104 [Abstract] (713) [HTML 1 KB] [PDF 1782 KB] (590)
57304 Zhang Yue (张月), Zhuo Qing-Qing (卓青青), Liu Hong-Xia (刘红侠), Ma Xiao-Hua (马晓华), Hao Yue (郝跃)
  Flat-roof phenomenon of dynamic equilibrium phase in the negative bias temperature instability effect on a power MOSFET
    Chin. Phys. B   2014 Vol.23 (5): 57304-057304 [Abstract] (539) [HTML 1 KB] [PDF 303 KB] (388)
5479 Hu Shi-Gang(胡仕刚),Hao Yue(郝跃), Ma Xiao-Hua(马晓华), Cao Yan-Rong(曹艳荣), Chen Chi(陈炽), and Wu Xiao-Feng(吴笑峰)
  Study on the degradation of NMOSFETs with ultra-thin gate oxide under channel hot electron stress at high temperature
    Chin. Phys. B   2009 Vol.18 (12): 5479-5484 [Abstract] (1571) [HTML 1 KB] [PDF 169 KB] (962)
1445 Liu Hong-Xia(刘红侠), Li Zhong-He(李忠贺), and Hao Yue(郝跃)
  Degradation characteristics and mechanism of PMOSFETs under NBT--PBT--NBT stress
    Chin. Phys. B   2007 Vol.16 (5): 1445-1449 [Abstract] (1449) [HTML 1 KB] [PDF 458 KB] (833)
833 Li Zhong-He (李忠贺), Liu Hong-Xia (刘红侠), Hao Yue (郝跃)
  The role of hydrogen in negative bias temperature instability of pMOSFET
    Chin. Phys. B   2006 Vol.15 (4): 833-838 [Abstract] (1521) [HTML 1 KB] [PDF 312 KB] (1320)
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